Data fusion by artificial neural network for hybrid metrology development

Autor: G. Rademaker, L. Penlap Woguia, Patrice Gergaud, Maxime Besacier, Jérôme Reche
Rok vydání: 2021
Předmět:
Zdroj: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
Popis: Hybrid metrology is a promising approach to access to the critical dimensions of line gratings with precisions. The objective of this work is about using artificial intelligence (AI), mainly artificial neural network (ANN) to improve metrology at nanoscale characterization by hybridization of several techniques. Namely, optical critical dimension (OCD) or scatterometry, CD–Scanning electron microscopy (CDSEM), CD–Atomic force microscopy (CDAFM) and CD–Small angle x-rays scattering (CDSAXS). With virtual data of tabular–type generated by modelling, the ANN is able to predict the geometrical parameters compared to true measured values with high accuracies and detect irregularities in input data.
Databáze: OpenAIRE