Studies on atomic layer deposition of MOF-5 thin films
| Autor: | David Grosso, Timo Sajavaara, Leo D. Salmi, Mikko Heikkilä, Esa Puukilainen, Mikko Ritala |
|---|---|
| Přispěvatelé: | Laboratoire de Chimie de la Matière Condensée de Paris (site Paris VI) (LCMCP (site Paris VI)), Université Pierre et Marie Curie - Paris 6 (UPMC)-Collège de France (CdF (institution))-Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Academy of Finland [121325], Centre of Excellence in Nuclear and Accelerator Based Physics |
| Jazyk: | angličtina |
| Rok vydání: | 2013 |
| Předmět: |
Materials science
Analytical chemistry 02 engineering and technology Chemical vapor deposition 010402 general chemistry 01 natural sciences Atomic layer deposition General Materials Science Thin film Fourier transform infrared spectroscopy ta116 ta114 General Chemistry [CHIM.MATE]Chemical Sciences/Material chemistry Nanoindentation Metal-organic frameworks 021001 nanoscience & nanotechnology Condensed Matter Physics 0104 chemical sciences Amorphous solid Elastic recoil detection Carbon film MOF-5 Mechanics of Materials ALD Hybrid materials 0210 nano-technology |
| Zdroj: | Microporous and Mesoporous Materials Microporous and Mesoporous Materials, 2013, 182, pp.147-154. ⟨10.1016/j.micromeso.2013.08.024⟩ Microporous and Mesoporous Materials, Elsevier, 2013, 182, pp.147-154. ⟨10.1016/j.micromeso.2013.08.024⟩ |
| ISSN: | 1387-1811 |
| DOI: | 10.1016/j.micromeso.2013.08.024⟩ |
| Popis: | International audience; Deposition of MOF-5 thin films from vapor phase by atomic layer deposition (ALD) was studied at 225-350 degrees C. Zinc acetate (ZnAc2) and 1,4-benzenedicarboxylic acid (1,4-BDC) were used as the precursors. The resulting films were characterized by UV-Vis spectrophotometry, Fourier transform infrared spectroscopy (FTIR), optical microscopy, X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), time-of-flight elastic recoil detection analysis (TOF-ERDA), isopropanol adsorption tests, and nanoindentation. It was found out that the as-deposited films were amorphous but crystallized in humid conditions at room temperature. The crystalline films had an unidentified structure with a large unit cell similar to MOF-5. High temperature XRD (HTXRD) of the films showed structural changes at 200 and 300 degrees C. A complete decomposition occurred at 400 degrees C. Adsorption tests showed no porosity in the films crystallized in the moist air. These films were recrystallized into the MOF-5 phase in an autoclave with dimethylformamide (DMF) at 150 degrees C which was confirmed by XRD. Two main uptake regions were seen in the isopropanol adsorption tests corresponding to micro- and macroporosity. |
| Databáze: | OpenAIRE |
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