Toxicological investigations in the semiconductor industry: II. Studies on the subacute inhalation toxicity and genotoxicity of gaseous waste products from the aluminum plasma etching process
| Autor: | P. Hoffmann, Kerstin Oemus, Nadeshda Werner, Siegfried Bauer, Ilona Wolff, Britt Damme |
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| Rok vydání: | 1992 |
| Předmět: |
Male
Health Toxicology and Mutagenesis Bone Marrow Cells Toxicology Body weight medicine.disease_cause Cardiovascular System Hazardous Substances Semiconductor industry Waste gas 03 medical and health sciences 0302 clinical medicine Waste Management Bone Marrow Occupational Exposure Administration Inhalation medicine Hydrocarbons Chlorinated Animals 030212 general & internal medicine Rats Wistar Chromosome Aberrations Plasma etching Inhalation Chemistry 030503 health policy & services Body Weight Public Health Environmental and Occupational Health Organ Size Rats Semiconductors Environmental chemistry Toxicity Room air distribution Female Volatilization 0305 other medical science Sister Chromatid Exchange Genotoxicity Blood Chemical Analysis Aluminum |
| Zdroj: | Toxicology and industrial health. 8(6) |
| ISSN: | 0748-2337 |
| Popis: | Male and female Wistar rats were exposed to waste gas arising from a plasma etching process in the semiconductor industries for six hr per day, five days per week, for four weeks in order to characterize subacute organ toxicity and genotoxicity. The waste gas was a complex mixture of different chlorinated hydrocarbons, inorganic by-products, and unused process gases, diluted by room air. Neither death nor behavioral changes occurred after subacute exposure. No significant exposure-related effects on body weight gain, hematology, or cardiovascular parameters were observed. Only slight effects on organ weights and clinical chemistry were seen in the exposed animals. The exposed rats of both sexes showed statistically significant increases in chromosomal aberrations and sister chromatid exchanges in bone marrow cells. |
| Databáze: | OpenAIRE |
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