Strategies for Increasing the Rate of Defect Annihilation in the Directed Self-Assembly of High-χ Block Copolymers
| Autor: | Jan Doise, Christopher J. Ellison, C. Grant Willson, Paulina Rincon Delgadillo, Natsuko Kinoshita, Jai Hyun Koh, Hyo Seon Suh, Qingjun Zhu, Ji Yeon Kim, Geert Vandenberghe |
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| Rok vydání: | 2019 |
| Předmět: |
Length scale
Materials science Annealing (metallurgy) 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences Nanolithography Chemical physics Copolymer General Materials Science Lamellar structure Wafer Thin film Dislocation 0210 nano-technology |
| Zdroj: | ACS Applied Materials & Interfaces. 11:48419-48427 |
| ISSN: | 1944-8252 1944-8244 |
| DOI: | 10.1021/acsami.9b17858 |
| Popis: | Directed self-assembly (DSA) of high-χ block copolymer thin films is a promising approach for nanofabrication of features with length scale below 10 nm. Recent work has highlighted that kinetics are of crucial importance in determining whether a block copolymer film can self-assemble into a defect-free ordered state. In this work, different strategies for improving the rate of defect annihilation in the DSA of a silicon-containing, high-χ block copolymer film were explored. Chemo-epitaxial DSA of poly(4-methoxystyrene-block-4-trimethylsilylstyrene) with 5× density multiplication was implemented on 300 mm wafers by using production level nanofabrication tools, and the influence of different processes and material parameters on dislocation defect density was studied. It was observed that only at sufficiently low χN can the block copolymer assemble into well-aligned patterns within a practical time frame. In addition, there is a clear correlation between the rate of the lamellar grain coarsening in unguided self-assembly and the rate of dislocation annihilation in DSA. For a fixed chemical pattern, the density of kinetically trapped dislocation defects can be predicted by measuring the correlation length of the unguided self-assembly under the same process conditions. This learning enables more efficient screening of block copolymers and annealing conditions by rapid analysis of block copolymer films that were allowed to self-assemble into unguided (commonly termed fingerprint) patterns. |
| Databáze: | OpenAIRE |
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