Thermal degradation of differently substituted Cylopentyl Polyhedral Oligomeric Silsesquioxane (CP-POSS) nanoparticles
| Autor: | Maria A. Chiacchio, Francesco A. Bottino, Ignazio Blanco, Lorenzo Abate, Paola Bottino |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2012 |
| Předmět: |
Thermogravimetric analysis
Materials science Silsesquioxanes chemistry.chemical_element Nanoparticle POSS Thermal degradation Atmospheric temperature range Condensed Matter Physics Nitrogen Silsesquioxane chemistry.chemical_compound chemistry Elemental analysis Polymer chemistry Proton NMR Phenyl group Physical and Theoretical Chemistry |
| Popis: | Seven variously substituted derivatives of polyhedral oligomeric silsesquioxanes (POSSs) with general formula R7R′1 (SiO1.5)8, where R- and R′- were a cyclopentyl and a substituted phenyl group, respectively, were prepared in this study, and their compositions were checked by elemental analysis, 1H NMR and 13C NMR spectroscopy. The compounds obtained were studied by TG and DTA techniques, in both flowing nitrogen and static air atmospheres, to draw useful information about their resistance to thermal degradation. Experiments, performed in the 35–700 °C temperature range, showed different behaviours between the two used atmospheres. The formation of volatile compounds only, with a near-complete mass loss, was observed under nitrogen; by contrast, in oxidative environment, a solid residue (≈50% in every case) was obtained because of the formation of SiO2 as indicated by the FTIR spectra performed. The results obtained for the various compounds investigated were discussed and compared with each other, and heat resistance classifications in the studied environments were made. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|