Nanowear on Polymer Films of Different Architecture
Autor: | Manfred Schmidt, Rüdiger Berger, Wolfgang Schärtl, Hans-Jürgen Butt, Ya-Jun Cheng, Bernd Gotsmann, Uwe Rietzler, Tadeusz Pakula, Jochen S. Gutmann, J. Windeln, Renate Förch, A. Strack |
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Rok vydání: | 2007 |
Předmět: |
chemistry.chemical_classification
Materials science Silicon chemistry.chemical_element Surfaces and Interfaces Polymer Condensed Matter Physics chemistry.chemical_compound chemistry visual_art Polymer chemistry Electrochemistry visual_art.visual_art_medium Copolymer Side chain General Materials Science Wafer Polystyrene Polycarbonate Methyl methacrylate Composite material Spectroscopy |
Zdroj: | Langmuir. 23:3150-3156 |
ISSN: | 1520-5827 0743-7463 |
DOI: | 10.1021/la0620399 |
Popis: | In this paper, we describe atomic force microscope (AFM) friction experiments on different polymers. The aim was to analyze the influence of the physical architecture of the polymer on the degree and mode of wear and on the wear mode. Experiments were carried out with (1) linear polystyrene (PS) and cycloolefinic copolymers of ethylene and norbornene, which are stabilized by entanglements, (2) mechanically stretched PS, (3) polyisoprene-b-polystyrene diblock copolymers, with varying composition, (4) brush polymers consisting of a poly(methyl methacrylate) (PMMA) backbone and PS side chains, (5) PMMA and PS brushes grafted from a silicon wafer, (6) plasma-polymerized PS, and (7) chemically cross-linked polycarbonate. For linear polymers, wear depends critically on the orientation of the chains with respect to the scan direction. With increasing cross-link density, wear was reduced and ripple formation was suppressed. The cross-linking density was the dominating material parameter characterizing wear. |
Databáze: | OpenAIRE |
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