Optical properties of alumina and zirconia thin films grown by pulsed laser deposition
| Autor: | T. Klotzbücher, Jens Gottmann, Ernst Wolfgang Kreutz, A. Husmann |
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| Přispěvatelé: | Publica |
| Rok vydání: | 1998 |
| Předmět: |
Diffraction
excimer laser Materials science Excimer laser optical property medicine.medical_treatment kinetic energy Analytical chemistry Surfaces and Interfaces General Chemistry interference reflection spectroscopy Condensed Matter Physics Microstructure alumina Fluence Surfaces Coatings and Films Pulsed laser deposition Ellipsometry Materials Chemistry medicine Thin film pulsed laser deposition Refractive index zirconia |
| Zdroj: | Scopus-Elsevier |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/s0257-8972(97)00661-0 |
| Popis: | Sintered targets of ZrO 2 and Al 2 O 3 are ablated by KrF excimer laser radiation. The processing gas atmosphere consists of O 2 at typical pressures of 10 -3 -l mbar. Films with a thickness of 2(1(1-70n nm are deposited on a Pt/Ti/Si multilayer substrate. The analytical techniques used for the determination of structural characteristics of the films are X-ray diffraction and electron microscopy. The thickness and the complex refraction index are determined by ellipsometry by fitting a model for the film geometry to the measured data. The optical film thickness at different wavelengths is determined using interference reflection photometry. The investigations concentrate on the influence of the oxygen pressure. the target-to-substrate distance and the laser fluence on the refraction index of the films. which is correlated with the film density. The compaction of the films is achieved by particles impinging with kinetic energies above 30 eV on the growing surface. The kinetic energy of the particles depending on the processing parameters is modelled and related to the resulting film properties. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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