Light Intensification Modeling of Coating Inclusions Irradiated at 351 and 1053 nm
| Autor: | Scott Hafeman, Christopher J. Stolz, Thomas V. Pistor |
|---|---|
| Rok vydání: | 2007 |
| Předmět: |
Diffraction
Materials science Materials Science (miscellaneous) engineering.material Industrial and Manufacturing Engineering law.invention X-ray laser Optics Coating law Irradiation Business and International Management Thin film Absorption (electromagnetic radiation) Microlens business.industry Laser Blueshift Wavelength Laser damage engineering Optoelectronics sense organs Oblique incidence Inclusion (mineral) business |
| Zdroj: | Optical Interference Coatings. |
| DOI: | 10.1364/oic.2007.fb5 |
| Popis: | Electric-field modeling provides insight into the laser damage resistance potential of nodular defects. The laser-induced damage threshold for high-reflector coatings is 13x lower at the third harmonic (351 nm) than at the first harmonic (1053 nm) wavelength. Linear and multiphoton absorption increases with decreasing wavelength, leading to a lower-third harmonic laser resistance. Electric-field effects can also be a contributing mechanism to the lower laser resistance with decreasing wavelength. For suitably large inclusions, the nodule behaves as a microlens. The diffraction-limited spot size decreases with wavelength, resulting in an increase in intensity. Comparison of electric-field finite-element simulations illustrates a 3x to 16x greater light intensification at the shorter wavelength. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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