Preparation and characterization of nanostructured titanium nitride thin films at room temperature

Autor: C. D. Gutiérrez-Lazos, F. Solis-Pomar, O. Nápoles, Angel Colin, Manuel F. Meléndrez, O. Vázquez Robaina, Eduardo Pérez-Tijerina, A. Fundora
Rok vydání: 2016
Předmět:
Zdroj: Ceramics International. 42:7571-7575
ISSN: 0272-8842
Popis: Nanostructured TiN thin films were grown by reactive magnetron sputtering deposition on Si (100) substrate at room temperature. The nanostructured TiN thin films were characterized by X-ray Diffraction (XRD), X-ray Photoelectron Spectroscopy (XPS), Scanning Electron Microscopy (SEM), Scanning Tunneling Microscopy (STM), Atomic Force Microscopy (AFM), resistivity and hydrophobicity tests. The nanostructured TiN thin films had an average grain size 4.6 nm, an average roughness of 1.3 nm, a preferential orientation in the [111] direction and also they showed hydrophobicity Type I. Fil: Solis Pomar, F.. Universidad Autónoma de Nuevo León; México Fil: Nápoles, O.. Universidad de La Habana; Cuba Fil: Vázquez Robaina, Odin. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad de La Habana; Cuba Fil: Gutierrez Lazos, C.. Universidad Autónoma de Nuevo León; México Fil: Fundora, A.. Universidad de La Habana; Cuba Fil: Colin, Angel. Universidad Autónoma de Nuevo León; México Fil: Pérez Tijerina, E.. Universidad Autónoma de Nuevo León; México Fil: Melendrez, M. F.. Universidad de Concepción; Chile
Databáze: OpenAIRE