Structure-related intercalation behaviour of LiCoO2 films
| Autor: | Henricus J.M. Bouwmeester, P.J. Bouwman, Bernard A. Boukamp, Peter H. L. Notten |
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| Přispěvatelé: | Inorganic Materials & Catalysis, Inorganic Materials Science, Faculty of Science and Technology, Inorganic Membranes |
| Jazyk: | angličtina |
| Rok vydání: | 2002 |
| Předmět: |
Materials science
Silicon business.industry Diffusion Intercalation (chemistry) Metallurgy chemistry.chemical_element General Chemistry Electrolyte Condensed Matter Physics Electrochemistry Preferential orientation Pulsed laser deposition METIS-211207 IR-72246 LiCoO chemistry Sputtering Intercalation Optoelectronics General Materials Science Thin film business |
| Zdroj: | Solid State Ionics, 152-153, 181-188. Elsevier Solid state ionics, 152-153, 181-188. Elsevier |
| ISSN: | 0167-2738 |
| Popis: | Submicron films of LiCoO2 have been deposited on silicon and stainless steel substrates using RF sputtering and pulsed laser deposition (PLD). Both films show preferred orientation. RF films have their Li diffusion plane oriented favourably, that is, perpendicular to the surface, while PLD films show a parallel, c-axis orientation. Electrochemical experiments indicate a strong dependence of the intercalation rate on the alignment of the host structure toward the electrolyte solution. Lithographic patterning enhances the inferior intercalation properties of the PLD film on silicon, as does the utilisation of stainless steel substrates. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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