Dip-In Photoresist for Photoinhibited Two-Photon Lithography to Realize High-Precision Direct Laser Writing on Wafer

Autor:	Chun Cao, Yiwei Qiu, Lingling Guan, Zhen Wei, Zhenyao Yang, Lanxin Zhan, Dazhao Zhu, Chenliang Ding, Xiaoming Shen, Xianmeng Xia, Cuifang Kuang, Xu Liu
Rok vydání:	2022
Předmět:	General Materials Science
Zdroj:	ACS Applied Materials & Interfaces. 14:31332-31342
ISSN:	1944-8252 1944-8244
DOI:	10.1021/acsami.2c08063
Popis:	For decades, photoinhibited two-photon lithography (PI-TPL) has been continually developed and applied into versatile nanofabrication. However, ultrahigh precision fabrication on wafer by PI-TPL remains challenging, due to the lack of a refractive index (
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::68c802c8bd35107cb77ab77f24ca68dc https://doi.org/10.1021/acsami.2c08063 Zobrazit plný text záznamu