New Condensation Polymer Precursors Containing Consecutive Silicon Atoms—Decaisopropoxycyclopentasilane and Dodecaethoxyneopentasilane—And Their Sol–Gel Polymerization
Autor: | Hyeon Mo Cho, Myong Euy Lee, Sangdeok Shim, Sungjin Park |
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Jazyk: | angličtina |
Rok vydání: | 2019 |
Předmět: |
Condensation polymer
Materials science porosity Polymers and Plastics Silicon oxidation of Si–Si bond polysilane chemistry.chemical_element sol–gel precursor Article lcsh:QD241-441 chemistry.chemical_compound lcsh:Organic chemistry Physisorption condensation polymer Magic angle spinning Sol-gel chemistry.chemical_classification technology industry and agriculture alkoxycyclopentasilane General Chemistry Polymer chemistry Polymerization Chemical engineering polysiloxane Polysilane alkoxyneopentasilane |
Zdroj: | Polymers Volume 11 Issue 5 Polymers, Vol 11, Iss 5, p 841 (2019) |
ISSN: | 2073-4360 |
Popis: | The sol&ndash gel polymerization of alkoxysilanes is a convenient and widely used method for the synthesis of silicon polymers and silicon&ndash organic composites. The development of new sol&ndash gel precursors is very important for obtaining new types of sol&ndash gel products. New condensation polymer precursors containing consecutive silicon atoms&mdash decaisopropoxycyclopentasilane (CPS) and dodecaethoxyneopentasilane (NPS)&mdash were synthesized for the preparation of polysilane&ndash polysiloxane material. The CPS and NPS xerogels were prepared by the sol&ndash gel polymerization of CPS and NPS under three reaction conditions (acidic, basic and neutral). The CPS and NPS xerogels were characterized using N2 physisorption measurements (Brunauer&ndash Emmett&ndash Teller BET and Brunauer-Joyner-Halenda BJH), solid-state CP/MAS (cross-polarization/magic angle spinning) NMRs (nuclear magnetic resonances), TEM, and SEM. Their porosity and morphology were strongly affected by the structure of the precursors, and partial oxidative cleavage of Si-Si bonds occurred during the sol&ndash gel process. The new condensation polymer precursors are expected to expand the choice of approaches for new polysilane&ndash polysiloxane. |
Databáze: | OpenAIRE |
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