Two-photon absorption laser induced fluorescence on O and O/sub 3/ in a dc plasma for oxidation of aluminum
| Autor: | B. Kniknie, B Bert Koopmans, Henk J. M. Swagten, K. Knechten, W. J. M. de Jonge, M.C.M. van de Sanden, Richard Engeln |
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| Přispěvatelé: | Physics of Nanostructures, Plasma & Materials Processing, Plasma-based gas conversion, Eindhoven Hendrik Casimir institute |
| Jazyk: | angličtina |
| Rok vydání: | 2004 |
| Předmět: |
Ozone
Materials science Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Plasma Condensed Matter Physics Oxygen Two-photon absorption Surfaces Coatings and Films chemistry.chemical_compound chemistry Ellipsometry Thin film Laser-induced fluorescence Absorption (electromagnetic radiation) |
| Zdroj: | Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 22(6), L11-L14. AVS Science and Technology Society |
| ISSN: | 0734-2101 |
| Popis: | It has been conjectured that atomic oxygen and ozone can have a great influence on the plasma oxidation of ultrathin aluminum for magnetic tunnel junctions. In order to measure the density of O and ozone, two-photon absorption laser induced fluorescence measurements are performed in the dc glow plasma that is used for the oxidation process. It was found that ozone is much more abundantly present compared to atomic oxygen. Using in situ, real-time ellipsometry measurements, we prove that ozone is not directly involved in the oxidation process. |
| Databáze: | OpenAIRE |
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