Oxygen-Interstitials And Group-V Element Doping For P-Type Zno
Autor: | A. M. Gsiea, J. P. Goss, P. R. Briddon, K. M. Etmimi |
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Jazyk: | angličtina |
Rok vydání: | 2013 |
Předmět: | |
DOI: | 10.5281/zenodo.1076229 |
Popis: | In realizing devices using ZnO, a key challenge is the production of p-type material. Substitution of oxygen by a group-V impurity is thought to result in deep acceptor levels, but a candidate made up from a complex of a group-V impurity (P, As, Sb) on a Zn site coupled with two vacant Zn sites is widely viewed as a candidate. We show using density-functional simulations that in contrast to such a view, complexes involving oxygen interstitials are energetically more favorable, resulting in group-V impurities coordinated with four, five or six oxygen atoms. {"references":["D. M. Bagnall, Y. F. Chen, , Z. Zhu, T. Yao, S. Koyama, M. Y. Shen,\nand T. Goto, Appl. Phys. Lett. 70, 2230 (1997).","Z. K. Tang, G. K. L.Wong, M. Yu, P. Kawasaki, A. Ohtomo, H. Koinuma,\nand Y. Segawa, Appl. Phys. Lett. 72, 464 (1998).","D. K. Hwang, S. H. Kang, J. H. Lim, E. J. Yang, J. Y. Oh, J. H. Yang,\nand S. J. Park, Appl. Phys. Lett. 86, 222101 (2005).","S. B. Zhang, S.-H. Wei, and A. Zunger, Phys. 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