Thin film growth models with long surface diffusion lengths
Autor: | Vitor B. de Sousa, Tung B.T. To, Fábio D.A. Aarão Reis |
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Jazyk: | angličtina |
Rok vydání: | 2020 |
Předmět: |
Statistics and Probability
Physics Surface diffusion Statistical Mechanics (cond-mat.stat-mech) Condensed matter physics Autocorrelation FOS: Physical sciences Surface finish Condensed Matter Physics Thermal diffusivity 01 natural sciences 010305 fluids & plasmas 0103 physical sciences Surface roughness Exponent Diffusion (business) 010306 general physics Scaling Condensed Matter - Statistical Mechanics |
Popis: | In limited mobility (LM) models of thin film deposition, the final position of each atom or molecule is chosen according to a set of stochastic rules before the incidence of another atom or molecule. Here we investigate the possibility of a LM model to reproduce features of a more realistic approach that represents the interplay of collective adatom diffusion and the external flux. In the LM model introduced here, each adatom may execute $G$ hops to neighboring columns of the deposit, but a hop attempt from a site with $n$ lateral neighbors has probability $P^n$, with $P Comment: Preprint for a publication in Physica A |
Databáze: | OpenAIRE |
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