W/B short period multilayer structures for soft x-rays
| Autor: | Andrey Yakshin, Andrey Zameshin, F. Bijkerk, Jacobus Marinus Sturm, Roman Medvedev |
|---|---|
| Přispěvatelé: | XUV Optics |
| Jazyk: | angličtina |
| Rok vydání: | 2020 |
| Předmět: |
010302 applied physics
Materials science Analytical chemistry General Physics and Astronomy chemistry.chemical_element Polishing 02 engineering and technology Sputter deposition 021001 nanoscience & nanotechnology 01 natural sciences lcsh:QC1-999 Ion chemistry.chemical_compound X-ray photoelectron spectroscopy chemistry Transmission electron microscopy Angle of incidence (optics) Boride 0103 physical sciences 0210 nano-technology Boron lcsh:Physics |
| Zdroj: | AIP Advances, Vol 10, Iss 4, Pp 045305-045305-8 (2020) AIP advances, 10(4):045305. American Institute of Physics |
| ISSN: | 2158-3226 |
| Popis: | X-ray W/B multilayer mirrors with a period of 2.5 nm were deposited by dc magnetron sputtering and studied in comparison with W/Si multilayer systems of the same period. Transmission electron microscopy, grazing incidence X-Ray reflectivity, and x-ray photoelectron spectroscopy analysis revealed that the layer quality and interfaces of the W/B multilayers are not better than those of the W/Si multilayers. Strong intermixing between W and B is present, which leads to compound formation with little or no pure W left after the interaction: an optically unfavorable boride formation and an increased roughness result in a reduced reflectivity. The deposited W/B multilayer mirrors showed a reflectivity of 34.5% at 0.84 nm and angle of incidence 9.7°, compared to 40% obtained for W/Si multilayers. Ion polishing applied on the boron layers did not result in improvements of the reflectivity. |
| Databáze: | OpenAIRE |
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