Block copolymer lithography: Feature size control and extension by an over-etch technique
| Autor: | Sozaraj Rasappa, Justin D. Holmes, Matthew T. Shaw, Michael A. Morris, Colm C. Faulkner, Peter Gleeson, Dipu Borah, Ramsankar Senthamaraikannan |
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| Rok vydání: | 2012 |
| Předmět: |
Plasma etching
Materials science Metals and Alloys Nanotechnology 02 engineering and technology Surfaces and Interfaces Substrate (electronics) 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Template chemistry Materials Chemistry Copolymer Lamellar structure Polystyrene Self-assembly 0210 nano-technology Lithography |
| Zdroj: | Thin Solid Films |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2012.09.017 |
| Popis: | Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene- b -polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed. |
| Databáze: | OpenAIRE |
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