Thin Film Resistors
| Autor: | E. M. Ma, F. M. Collins, Wayne A. Anderson |
|---|---|
| Rok vydání: | 2005 |
| Předmět: |
Fabrication
Materials science business.industry Electrical engineering Chemical vapor deposition Engineering physics Ruthenium oxide Power (physics) law.invention chemistry.chemical_compound Computer Science::Emerging Technologies Tantalum nitride chemistry law Optoelectronics Nichrome Thin film Resistor business Temperature coefficient Voltage Design technology |
| Zdroj: | Wiley Encyclopedia of Electrical and Electronics Engineering |
| DOI: | 10.1002/0471654507.eme452 |
| Popis: | In this article, we will discuss the historical background and technological evolution of thin film resistors. We will also review resistor technology design concepts, including requirements for (1) the range of resistance values, (2) their precision, and (3) the physical size in terms of power or voltage demands, materials used in production, finished formats, performance characteristics, and some advantages of integrated thin film resistor production. Keywords: thin film resistors; temperature coefficient of resistance; chemical vapor deposition; network |
| Databáze: | OpenAIRE |
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