Cleaning of Gold Interconnection Surface by Low-temperature Hydrogen Annealing for MEMS Device Fabrication

Autor:	Kei Kuwabara, Kazuyoshi Ono, Norio Sato, Hiromu Ishii, Tomomi Sakata, Katsuyuki Machida
Rok vydání:	2008
Předmět:	Microelectromechanical systems Surface (mathematics) Hydrogen annealing Interconnection Materials science Fabrication technology industry and agriculture Nanotechnology
Zdroj:	ECS Transactions. 16:29-35
ISSN:	1938-6737 1938-5862
DOI:	10.1149/1.2992225
Popis:	A technique for cleaning a gold surface using a dry process is described for the fabrication of microelectromechanical system (MEMS) devices. X-ray photoelectron spectroscopy (XPS) shows that gold is oxidized after exposure to oxygen plasma used for ashing of organic contaminants or etching of a sacrificial-layer film. On such oxidized gold surface, there are different incubations at the different places, which give rise to non-uniform thickness in film growth by electrochemical techniques, such as electrodeposition and electroplating. A surface analysis by thermal desorption spectroscopy (TDS) revealed that annealing causes oxygen to desorb from the gold oxide. The surfaces were annealed in a vacuum or nitrogen or hydrogen ambient to examine the effectiveness of dry-process surface cleaning. For the annealing in a vacuum and nitrogen ambient, a temperature of over 260° is necessary for the oxide removal. Annealing in hydrogen ambient drastically lowers the cleaning temperature from 260 to 110°.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::606455bc900518446751fd0425991adb https://doi.org/10.1149/1.2992225 Zobrazit plný text záznamu