| Autor: |
Michael R. Winchester, Nicholas W. M. Ritchie, John A. Small, Dale E. Newbury, Lee J. Richter, Shirley Turner, Keana C. Scott, Rick L. Paul, Douglas C. Meier, Donna B. Klinedinst, Stefan D. Leigh, Savelas A. Rabb, Ryna B. Marinenko, Lee L. Yu, Rolf Zeisler, David S. Simons |
| Rok vydání: |
2009 |
| Předmět: |
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| Zdroj: |
Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada. 16(1) |
| ISSN: |
1435-8115 |
| Popis: |
Bulk silicon-germanium (SiGe) alloys and two SiGe thick films (4 and 5 μm) on Si wafers were tested with the electron probe microanalyzer (EPMA) using wavelength dispersive spectrometers (WDS) for heterogeneity and composition for use as reference materials needed by the microelectronics industry. One alloy with a nominal composition of Si0.86Ge0.14and the two thick films with nominal compositions of Si0.90Ge0.10and Si0.75Ge0.25on Si, evaluated for micro- and macroheterogeneity, will make good microanalysis reference materials with an overall expanded heterogeneity uncertainty of 1.1% relative or less for Ge. The bulk Ge composition in the Si0.86Ge0.14alloy was determined to be 30.228% mass fraction Ge with an expanded uncertainty of the mean of 0.195% mass fraction. The thick films were quantified with WDS-EPMA using both the Si0.86Ge0.14alloy and element wafers as reference materials. The Ge concentration was determined to be 22.80% mass fraction with an expanded uncertainty of the mean of 0.12% mass fraction for the Si0.90Ge0.10wafer and 43.66% mass fraction for the Si0.75Ge0.25wafer with an expanded uncertainty of the mean of 0.25% mass fraction. The two thick SiGe films will be issued as National Institute of Standards and Technology Reference Materials (RM 8905). |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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