Impact of Traps and Strain on Optimized n- and p-Type TFETs Integrated on the Same InAs/AlGaSb Technology Platform

Autor: Susanna Reggiani, Michele Visciarelli, Antonio Gnudi, Giorgio Baccarani, Elena Gnani
Přispěvatelé: Visciarelli, Michele, Gnani, Elena, Gnudi, Antonio, Reggiani, Susanna, Baccarani, Giorgio
Rok vydání: 2017
Předmět:
Zdroj: IEEE Transactions on Electron Devices. 64:3108-3113
ISSN: 1557-9646
0018-9383
Popis: A simulation study on the impact of interface traps and strain on the ${I}$ – ${V}$ characteristics of co-optimized p- and n-type tunnel FETs (TFETs) realized on the same InAs/Al0.05Ga0.95Sb technology platform is carried out, using a full-quantum ballistic simulator. In order to capture the effect of interface/border traps on the device electrostatics consistently with carrier degeneracy and ballistic transport, the classical Shockley-Read–Hall theory has been properly generalized. The effect of an experimental ${D}_{\mathrm {it}}$ distribution of a high- ${k}$ gate stacks on InAs has been investigated. Unfortunately, traps induce a significant reduction of the ON-state current. However, it turns out that localized strain at the source/channel heterojunction caused by lattice mismatch is able to induce for the n-type TFET, a performance enhancement with respect to the ideal device even in the presence of traps. On the contrary, for the p-type one, a current degradation $\simeq 18$ % is observed.
Databáze: OpenAIRE