Bevel contamination management in 3D integration by localized SiO2 deposition

Autor:	François Boulard, Vincent Gros, Christophe Porzier, Laurent Brunet, Valérie Lapras, Frank Fournel, Delphine Truffier-Boutry, Delphine Autillo, Patrick Ruault, Moty Keovisai, Nicolas Posseme
Rok vydání:	2022
Předmět:	History Polymers and Plastics Business and International Management Electrical and Electronic Engineering Condensed Matter Physics Industrial and Manufacturing Engineering Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	Microelectronic Engineering. 265:111875
ISSN:	0167-9317
DOI:	10.1016/j.mee.2022.111875
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5e4133e17fc4a4fe809e7b898dcd9ec0 https://doi.org/10.1016/j.mee.2022.111875 Zobrazit plný text záznamu Full Text from ScienceDirect