Reduction of Graphene Oxide Thin Films by Cobaltocene and Decamethylcobaltocene
Autor: | Saurabh Acharya, Stephen Maldonado, Sofiya Hlynchuk, Molly M. MacInnes, Nicolai Lehnert |
---|---|
Rok vydání: | 2017 |
Předmět: |
Materials science
Graphene Oxide 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences law.invention symbols.namesake chemistry.chemical_compound Chemical engineering X-ray photoelectron spectroscopy chemistry law Cobaltocene symbols Trifluoroacetic acid General Materials Science Decamethylcobaltocene Thin film 0210 nano-technology Raman spectroscopy |
Zdroj: | ACS Applied Materials & Interfaces. 10:2004-2015 |
ISSN: | 1944-8252 1944-8244 |
DOI: | 10.1021/acsami.7b15599 |
Popis: | Reduced graphene oxide (RGO) films have been prepared by immersion of graphene oxide (GO) films at room temperature in nonaqueous solutions containing simple, outer-sphere metallocene reductants. Specifically, solutions of cobaltocene, cobaltocene and trifluoroacetic acid (TFA), and decamethylcobaltocene each showed activity for the rapid reduction of GO films cast on a wide variety of substrates. Each reactant increased the conductivity of the films by several orders of magnitude, with RGO films prepared with either decamethylcobaltocene or cobaltocene and TFA possessing the highest conductivities (∼104 S m–1). X-ray photoelectron spectroscopy suggested that while all three reagents lowered the content of carbon–oxygen functionalities, solutions of cobaltocene and TFA were the most effective at reducing the material to sp2 carbon. Separately, Raman spectra and atomic force micrographs indicated that RGO films prepared with decamethylcobaltocene consisted of the largest graphitic domains and lowest macros... |
Databáze: | OpenAIRE |
Externí odkaz: |