Diimide formation on the Ni(100) surface
| Autor: | John L. Gland, Sean X. Huang, Tecle S. Rufael |
|---|---|
| Rok vydání: | 1993 |
| Předmět: |
Hydrogen
Chemistry Inorganic chemistry Thermal decomposition Hydrazine Thermal desorption chemistry.chemical_element Surfaces and Interfaces Condensed Matter Physics Photochemistry Decomposition Surfaces Coatings and Films chemistry.chemical_compound Adsorption Diimide Materials Chemistry Chemical decomposition |
| Zdroj: | Surface Science Letters. 290:L673-L676 |
| ISSN: | 0167-2584 |
| DOI: | 10.1016/0167-2584(93)90902-u |
| Popis: | Diimide (N 2 H 2 ), an extremely reactive species, is observed as a gas phase product from the Ni(100) surface in the 200 to 450 K range during hydrazine thermal decomposition and during thermal desorption of predissociated ammonia. These results suggest that the primary mechanism for diimide formation is recombination of an adsorbed NH surface intermediate. The observation that diimide can be formed from predissociated ammonia illustrates that a nitrogennitrogen bond in the precursor is not required for diimide formation. Diimide formation from predissociated ammonia is enhanced by coadsorbed hydrogen, which we believe stabilizes NH on the Ni(100) surface. In addition, the direct decomposition of adsorbed N 2 H 4 contributes to the production of diimide at 230 K. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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