Modeling of C 4 F 8 inductively coupled plasmas: effects of high RF power on the plasma electrical properties
| Autor: | Aurélie Girard, Guillaume Le Dain, Mohamed Boufnichel, Ahmed Rhallabi, Christophe Cardinaud, F. Roqueta |
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| Přispěvatelé: | Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN), STMicroelectronics [Tours] (ST-TOURS) |
| Jazyk: | angličtina |
| Rok vydání: | 2019 |
| Předmět: |
010302 applied physics
Materials science 02 engineering and technology Fermion Plasma Electron 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences symbols.namesake Etching (microfabrication) Ionization 0103 physical sciences symbols [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] Electron temperature Langmuir probe Atomic physics 0210 nano-technology Excitation ComputingMilieux_MISCELLANEOUS |
| Zdroj: | Plasma Sources Science and Technology Plasma Sources Science and Technology, IOP Publishing, 2019, 28 (8), pp.085002. ⟨10.1088/1361-6595/ab27d0⟩ |
| ISSN: | 0963-0252 1361-6595 |
| Popis: | International audience |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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