Fabrication of patterned magnetic nanodots by laser interference lithography
| Autor: | J. C. Lodder, H.A.G.M. van Wolferen, Leon Abelmann, R. Murillo |
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| Rok vydání: | 2005 |
| Předmět: |
Materials science
business.industry technology industry and agriculture Photoresist TST-LIL: Laser Interference Lithography Condensed Matter Physics SMI-TST: From 2006 in EWI-TST Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention SMI-MAT: MATERIALS Optics Anti-reflective coating Etching (microfabrication) law Patterned media Nanodot TST-uSPAM: micro Scanning Probe Array Memory Electrical and Electronic Engineering Photolithography Magnetic force microscope business Lithography |
| Zdroj: | Microelectronic engineering, 78-79, 260-265. Elsevier |
| ISSN: | 0167-9317 |
| Popis: | A method of fabrication of patterned magnetic nanodots by means of laser interference lithography is presented. This method includes the use of a diluted positive photoresist, and modifcations in the etching angle and acceleration voltage of the ion beam etching process. Vertical standing waves were suppressed by using a high exposure dose (supra-exposure) instead of an antireflective coating. Field dependent magnetic force microscopy was used to measure the switching field distribution, which was found to range from 80 to 192 kA/m. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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