The Nanolithography Toolbox
| Autor: | Christopher H. Ray, Ian Gilbert, Kartik Srinivasan, David A. Czaplewski, Brian A. Bryce, Krishna C. Balram, Christopher B. Wallin, Meredith Metzler, Slava Krylov, Karen E. Grutter, Leonidas E. Ocola, Vladimir A. Aksyuk, Juraj Topolancik, Thomas Michels, Richard Kasica, Neal A. Bertrand, J. Alexander Liddle, Nicolae Lobontiu, Liya Yu, Marcelo Davanco, Gregory Simelgor, Yuxiang Liu, Gerald G. Lopez, Daron A. Westly, Samuel M. Stavis, Vojtech Svatos, Kristen A. Dill, B. Robert Ilic, Qing Li, Pavel Neuzil |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
Engineering drawing
Lithography Computer science Parameterized complexity Nanotechnology 02 engineering and technology Nanofluidic computer.software_genre Nanofabrication 01 natural sciences Nanoscale curved features Article Nanoplasmonic 010309 optics Nanophotonic 0103 physical sciences CAD Microelectromechanical systems Nanoelectromechanical systems General Engineering 021001 nanoscience & nanotechnology Toolbox Nanoscale design Nanoscale devices Nanolithography Scripting language NIST 0210 nano-technology computer |
| Zdroj: | J Res Natl Inst Stand Technol Balram, K C, Westly, D A, Davanço, M, Grutter, K E, Li, Q, Michels, T, Ray, C H, Yu, L, Kasica, R J, Wallin, C B, Gilbert, I J, Bryce, B A, Simelgor, G, Topolancik, J, Lobontiu, N, Liu, Y, Neuzil, P, Svatos, V, Dill, K A, Bertrand, N A, Metzler, M G, Lopez, G, Czaplewski, D A, Ocola, L, Srinivasan, K A, Stavis, S M, Aksyuk, V A, Alexander Liddle, J, Krylov, S & Robert Ilic, B 2016, ' The Nanolithography Toolbox ', Journal of Research of the National Institute of Standards and Technology, vol. 121, pp. 464-475 . https://doi.org/10.6028/jres.121.024 |
| ISSN: | 1044-677X |
| DOI: | 10.6028/jres.121.024 |
| Popis: | This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab design devices with complex curves and aggressive critical dimensions. Using parameterized shapes as building blocks, the Nanolithography Toolbox allows users to rapidly design and layout nanoscale devices of arbitrary complexity through scripting and programming. The Toolbox offers many parameterized shapes, including structure libraries for micro- and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic devices. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or create vectorized shapes using Bezier curves. Parameterized control allows users to design smooth curves with complex shapes. The Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|