Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

Autor: Silvia Leticia Fernandes, Roberto Ramos Júnior, Elson Longo, Lucas Jorge Affonço, Carlos Frederico de Oliveira Graeff, José Humberto Dias da Silva
Přispěvatelé: Universidade Federal de São Carlos (UFSCar), Universidade Estadual Paulista (Unesp)
Rok vydání: 2019
Předmět:
Zdroj: Scopus
Repositório Institucional da UNESP
Universidade Estadual Paulista (UNESP)
instacron:UNESP
ISSN: 1940-087X
Popis: Made available in DSpace on 2020-12-12T02:27:01Z (GMT). No. of bitstreams: 0 Previous issue date: 2019-01-01 Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) Reactive sputtering is a versatile technique used to form compact films with excellent homogeneity. In addition, it allows easy control over deposition parameters such as gas flow rate that results in changes on composition and thus in the film required properties. In this report, reactive sputtering is used to deposit niobium oxide films. A niobium target is used as metal source and different oxygen flow rates to deposit niobium oxide films. The oxygen flow rate was changed from 3 to 10 sccm. The films deposited under low oxygen flow rates show higher electrical conductivity and provide better perovskite solar cells when used as electron transport layer. Chemistry Department Federal University of São Carlos (UFSCAR) Physics Department School of Sciences São Paulo State University (UNESP) Physics Department School of Sciences São Paulo State University (UNESP) FAPESP: 2013/07296-2 FAPESP: 2013/09963-6 FAPESP: 2017/11072-3 FAPESP: 2017/18916-2
Databáze: OpenAIRE