Application of static masking technique in magnetron sputtering technology for the production of linearly variable filters
| Autor: | Harro Hagedorn, Julien Lumeau, Detlef Arhilger, Antonin Moreau, F. Lemarquis, Holger Reus, Fabien Lemarchand, Thomas Begou |
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| Přispěvatelé: | RCMO (RCMO), Institut FRESNEL (FRESNEL), Centre National de la Recherche Scientifique (CNRS)-École Centrale de Marseille (ECM)-Aix Marseille Université (AMU)-Centre National de la Recherche Scientifique (CNRS)-École Centrale de Marseille (ECM)-Aix Marseille Université (AMU), Buhler AG, Aix Marseille Université (AMU)-École Centrale de Marseille (ECM)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU)-École Centrale de Marseille (ECM)-Centre National de la Recherche Scientifique (CNRS) |
| Rok vydání: | 2021 |
| Předmět: |
Masking (art)
linearly variable filters Materials science magnetron sputtering business.industry optical interference filters Aerospace Engineering 02 engineering and technology Sputter deposition 021001 nanoscience & nanotechnology deposition technology 01 natural sciences 010309 optics Variable (computer science) Space and Planetary Science 0103 physical sciences [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic Optoelectronics Production (economics) Optical coatings 0210 nano-technology business |
| Zdroj: | CEAS Space Journal CEAS Space Journal, Springer, In press CEAS Space Journal, 2021, ⟨10.1007/s12567-021-00402-3⟩ |
| ISSN: | 1868-2510 1868-2502 |
| Popis: | International audience; Variable filters are key components for compact spectral imagers. In this paper, we present a method for the fabrication of linearly variable filters based on Bühler HELIOS machine (plasma assisted reactive magnetron sputtering). These filters are obtained by producing a variation of the thickness of all the layers of the coating, using adapted masks placed in between the sputtering targets for the low and high refractive index materials and the substrates. Variable band pass filter from 550 nm up to 1000 nm is demonstrated. |
| Databáze: | OpenAIRE |
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