Substrate aberration and correction for meta-lens imaging: an analytical approach
| Autor: | Byrnes Steven J, Benedikt Groever, Charles Roques-Carmes, Federico Capasso |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
Materials science
Laser printing business.industry Phase (waves) Physics::Optics 02 engineering and technology Substrate (printing) 021001 nanoscience & nanotechnology Laser 01 natural sciences Atomic and Molecular Physics and Optics Numerical aperture law.invention 010309 optics Lens (optics) Optics law 0103 physical sciences Focal length Electrical and Electronic Engineering 0210 nano-technology business Engineering (miscellaneous) Maskless lithography |
| Zdroj: | Applied optics. 57(12) |
| ISSN: | 1539-4522 |
| Popis: | Meta-lenses based on flat optics enabled a fundamental shift in lens production-providing an easier manufacturing process with an increase in lens profile precision and a reduction in size and weight. Here we present an analytical approach to correct spherical aberrations caused by light propagation through the substrate by adding a substrate-corrected phase profile, which differs from the original hyperbolic one. A meta-lens encoding the new phase profile would yield diffraction-limited focusing and an increase of up to 0.3 of its numerical aperture without changing the radius or focal length. In tightly focused laser spot applications such as direct laser lithography and laser printing, a substrate-corrected meta-lens can reduce the spatial footprint of the meta-lens. |
| Databáze: | OpenAIRE |
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