Deposition and characterisation of sputtered molybdenum oxide thin films with hydrogen atmosphere
| Autor: | Pablo Ortega, Eloi Ros, José Miguel Asensi, Joan Bertomeu, Thomas Tom, Nicolau Lopez-Pinto, Cristobal Voz |
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| Přispěvatelé: | Universitat Politècnica de Catalunya. Doctorat en Enginyeria de la Construcció, Universitat Politècnica de Catalunya. Doctorat en Enginyeria Electrònica, Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica, Universitat Politècnica de Catalunya. MNT - Grup de Recerca en Micro i Nanotecnologies |
| Rok vydání: | 2021 |
| Předmět: |
Molibdè
Materials science Hydrogen Reactive sputtering Thin films Analytical chemistry General Physics and Astronomy chemistry.chemical_element 02 engineering and technology Substrate (electronics) 010402 general chemistry 01 natural sciences Molybdenum trioxide MoO3 thin films chemistry.chemical_compound X-ray photoelectron spectroscopy Sputtering Thin film Deposition (law) Pel·lícules fines Molybdenum Enginyeria electrònica::Optoelectrònica [Àrees temàtiques de la UPC] Reduced molybdenum oxide Surfaces and Interfaces General Chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 0104 chemical sciences Surfaces Coatings and Films Molybdenum oxides chemistry Hydrogen atmosphere 0210 nano-technology Stoichiometry |
| Zdroj: | Dipòsit Digital de la UB Universidad de Barcelona UPCommons. Portal del coneixement obert de la UPC Universitat Politècnica de Catalunya (UPC) |
| Popis: | Sputtered films of reduced molybdenum oxide (MoOx) with a molybdenum trioxide target in different pressures and atmospheres were deposited in varying temperatures. Compositional, optic, and electric characteristics of the samples were studied. X-ray photoelectron spectroscopy revealed reduced states when working in the hydrogen + argon atmosphere implying that stoichiometry could be controlled by adding some hydrogen in the sputtering chamber. The effect of slightly increasing the substrate temperature during deposition was also studied and lead to the presence of metastable Mo4+ states at 3 mTorr. Optical properties match the ones already in the literature, and transmittances of 90% were achieved. The results support sputtering as a viable method of depositing MoOx films apart from thermal evaporation for many applications. This research has been supported by the Spanish Ministerio de Economía, Industria y Competitividad (ENE2016-78933-C4-1-R and ENE2016-78933-C4-2-R), Ministerio de Ciencia e Innovación (PID2019-109215RB-C4-1 and PID2019-109215RB-C4-3) and the European Regional Development Fund. One of the authors (T. Tom) acknowledges the support of the Secretaria d'Universitats i Recerca de la Generalitat de Catalunya and European Social Fund (2019 FI_B 00456). |
| Databáze: | OpenAIRE |
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