Monitoring of particle deposition in cleanrooms: State-of-the-art

Autor: Djemel Lellouchi, Nina Menant, Pascal Nouet, Delphine Faye, Xavier Lafontan
Přispěvatelé: Conception et Test de Systèmes MICroélectroniques (SysMIC), Laboratoire d'Informatique de Robotique et de Microélectronique de Montpellier (LIRMM), Centre National de la Recherche Scientifique (CNRS)-Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS)-Université de Montpellier (UM), Centre National d’Études Spatiales [Paris] (CNES), INTESENS
Rok vydání: 2014
Předmět:
Zdroj: 16th Symposium on Design, Test, Integration & Packaging of MEMS and MOEMS
DTIP: Design, Test, Integration and Packaging
DTIP: Design, Test, Integration and Packaging, Apr 2014, Cannes, France. pp.368-371, ⟨10.1109/DTIP.2014.7056699⟩
Popis: International audience; Cleanrooms are classified by the cleanliness of air and surface. Classification defined by ISO 14644-1 and 14644-9 is given by the number of particle larger than a critical size in a quantity of volume or surface. No reliable data give the correlation between the air and surface particulate contamination. Various environmental parameters and operating factors determine the particle deposition rate in cleanrooms. The particle deposition real-time monitoring is a concern for numerous application fields such as microelectronics, imaging devices, pharmaceutical industries, agribusiness and space where the risk of contamination by sedimentation of particle is critical for sensitive instruments. New developments in the field of particle deposition monitoring devices are necessary to better classify cleanrooms and improve the control of the cleanliness of surfaces.
Databáze: OpenAIRE