Intrinsic and extrinsic performance limits of graphene devices on SiO2

Autor: Shudong Xiao, Michael S. Fuhrer, Masa Ishigami, Jian-Hao Chen, Chaun Jang
Rok vydání: 2008
Předmět:
Zdroj: Nature Nanotechnology. 3:206-209
ISSN: 1748-3395
1748-3387
DOI: 10.1038/nnano.2008.58
Popis: The linear dispersion relation in graphene[1,2] gives rise to a surprising prediction: the resistivity due to isotropic scatterers (e.g. white-noise disorder[3] or phonons[4-8]) is independent of carrier density n. Here we show that acoustic phonon scattering[4-6] is indeed independent of n, and places an intrinsic limit on the resistivity in graphene of only 30 Ohm at room temperature (RT). At a technologically-relevant carrier density of 10^12 cm^-2, the mean free path for electron-acoustic phonon scattering is >2 microns, and the intrinsic mobility limit is 2x10^5 cm^2/Vs, exceeding the highest known inorganic semiconductor (InSb, ~7.7x10^4 cm^2/Vs[9]) and semiconducting carbon nanotubes (~1x10^5 cm^2/Vs[10]). We also show that extrinsic scattering by surface phonons of the SiO2 substrate[11,12] adds a strong temperature dependent resistivity above ~200 K[8], limiting the RT mobility to ~4x10^4 cm^2/Vs, pointing out the importance of substrate choice for graphene devices[13].
16 pages, 3 figures
Databáze: OpenAIRE