Fast prototyping of high-aspect ratio, high-resolution X-ray masks by gas-assisted focused ion beam
| Autor: | C. Khan Malek, Jayant Neogi, F. T. Hartley |
|---|---|
| Přispěvatelé: | Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174) (FEMTO-ST), Université de Technologie de Belfort-Montbeliard (UTBM)-Ecole Nationale Supérieure de Mécanique et des Microtechniques (ENSMM)-Université de Franche-Comté (UFC), Université Bourgogne Franche-Comté [COMUE] (UBFC)-Université Bourgogne Franche-Comté [COMUE] (UBFC)-Centre National de la Recherche Scientifique (CNRS) |
| Rok vydání: | 2003 |
| Předmět: |
010302 applied physics
Materials science business.industry Diamond 02 engineering and technology engineering.material 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Focused ion beam Electronic Optical and Magnetic Materials Micrometre Surface micromachining Optics Hardware and Architecture Etching (microfabrication) 0103 physical sciences engineering X-ray lithography Electrical and Electronic Engineering 0210 nano-technology business LIGA Lithography ComputingMilieux_MISCELLANEOUS |
| Zdroj: | Microsystem Technologies Microsystem Technologies, Springer Verlag, 2003, 9, pp.409-412 |
| ISSN: | 1432-1858 0946-7076 |
| DOI: | 10.1007/s00542-002-0215-5 |
| Popis: | The capacity of chemically-assisted focused ion beam (FIB) etching systems to undertake direct and highly anisotropic erosion of thin and thick gold (or other high atomic number {Z}) coatings on X-ray mask membranes/substrates provides new levels of precision, flexibility, simplification and rapidity in the manufacture of mask absorber patterns, allowing for fast prototyping of high-aspect ratio, high-resolution masks for deep X-ray lithography for the LIGA process. In preliminary demonstrations, an automated FIB system operating at 30 keV with a gallium liquid metal source and an iodine gas injection system was used for direct milling into a few micrometer thick gold of microstructures into the sub-hundred nanometer regime. Three-dimensional micromachining in bulk diamond is also reported to illustrate the capability of the technique. |
| Databáze: | OpenAIRE |
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