Effect of low RF bias potential on AlN films obtained by Microwave Plasma Enhanced Chemical Vapor Deposition
| Autor: | Pascal Tristant, Florent Tetard, Christelle Dublanche-Tixier, Gustavo Sanchez, A. Bologna Alles |
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| Přispěvatelé: | Laboratoire des Sciences des Procédés et des Matériaux (LSPM), Université Paris 13 (UP13)-Institut Galilée-Université Sorbonne Paris Cité (USPC)-Centre National de la Recherche Scientifique (CNRS), Groupe d'étude de l'atmosphère météorologique (CNRM-GAME), Institut national des sciences de l'Univers (INSU - CNRS)-Météo France-Centre National de la Recherche Scientifique (CNRS), Axe 2 : procédés plasmas et lasers (SPCTS-AXE2), Science des Procédés Céramiques et de Traitements de Surface (SPCTS), Université de Limoges (UNILIM)-Ecole Nationale Supérieure de Céramique Industrielle (ENSCI)-Institut des Procédés Appliqués aux Matériaux (IPAM), Université de Limoges (UNILIM)-Université de Limoges (UNILIM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université de Limoges (UNILIM)-Ecole Nationale Supérieure de Céramique Industrielle (ENSCI)-Institut des Procédés Appliqués aux Matériaux (IPAM), Université de Limoges (UNILIM)-Université de Limoges (UNILIM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Faculté Ingenieria, Université Republica, Centre National de la Recherche Scientifique (CNRS)-Université Sorbonne Paris Cité (USPC)-Institut Galilée-Université Paris 13 (UP13), Institut des Procédés Appliqués aux Matériaux (IPAM), Université de Limoges (UNILIM)-Université de Limoges (UNILIM)-Ecole Nationale Supérieure de Céramique Industrielle (ENSCI)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université de Limoges (UNILIM)-Institut des Procédés Appliqués aux Matériaux (IPAM), Université de Limoges (UNILIM)-Université de Limoges (UNILIM)-Ecole Nationale Supérieure de Céramique Industrielle (ENSCI)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université de Limoges (UNILIM) |
| Rok vydání: | 2014 |
| Předmět: |
010302 applied physics
Materials science Analytical chemistry [CHIM.MATE]Chemical Sciences/Material chemistry 02 engineering and technology Surfaces and Interfaces General Chemistry Chemical vapor deposition 021001 nanoscience & nanotechnology Condensed Matter Physics Microstructure 01 natural sciences Piezoelectricity Ion source Surfaces Coatings and Films Plasma-enhanced chemical vapor deposition Residual stress 0103 physical sciences Ultimate tensile strength Materials Chemistry Crystallite Composite material 0210 nano-technology ComputingMilieux_MISCELLANEOUS |
| Zdroj: | Surface and Coatings Technology Surface and Coatings Technology, Elsevier, 2014, 256, pp.3-8. ⟨10.1016/j.surfcoat.2013.10.067⟩ |
| ISSN: | 0257-8972 |
| Popis: | AlN films were prepared with a Microwave Plasma Enhanced Chemical Vapor Deposition reactor at 1 Pa and 700 °C using different radiofrequency bias in order to obtain polycrystalline oriented films with minimal residual stresses for piezoelectric applications. The films developed were characterized in term of microstructure, composition and mechanical properties. Crystalline development, exclusive orientation and high tensile residual stresses were observed when the substrate-holder was at the floating potential. A progressive degradation of the crystalline structure was observed with the increase in the negative bias potential, together with the evolution to compressive residual stresses. Simultaneously, significant changes in the microstructure of the surface were observed by atomic force microscopy, as well as in the preferential orientation from to 1 0>. Film properties for piezoelectric applications were optimized with the adequate selection of bias potential. |
| Databáze: | OpenAIRE |
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