Solution-Processed High-Performance ZnO Nano-FETs Fabricated with Direct-Write Electron-Beam-Lithography-Based Top-Down Route

Autor:	Tiwale, N, Senanayak, SP, Rubio-Lara, J, Prasad, A, Aziz, A, Alaverdyan, Y, Welland, ME
Přispěvatelé:	Tiwale, N [0000-0001-8229-7108], Senanayak, SP [0000-0002-8927-685X], Rubio-Lara, J [0000-0001-9617-3691], Apollo - University of Cambridge Repository
Rok vydání:	2021
Předmět:	electron-beam lithography field-effect transistors ZnO solution processing direct-write patterning
DOI:	10.17863/cam.64821
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::521372536a132015dadb3e479a8704af Zobrazit plný text záznamu