Fast Processing of Sol-Gel TCO
Autor: | Deelen, J. van, Rem, M., Arfsten, N., Buskens, P.P. |
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Jazyk: | angličtina |
Rok vydání: | 2016 |
Předmět: | |
Zdroj: | Proceedings 32nd European Photovoltaic Solar Energy Conference and Exhibition EU PVSEC, 96, 9, 155-157 |
Popis: | 32nd European Photovoltaic Solar Energy Conference and Exhibition; 155-157 TCOs are usually deposited using sputtering or chemical vapor deposition, which have a yield of typically 50-75%. The sol gel method does not need low pressure and can be done with a high precursor yield in the range of 90 – 100%. Sol gel enables also the TCO function as a planarization or texturisation layer. Major drawback and cost driver is the annealing step. The annealing process parameter requirements are highly related to the ingredients and their preparation. These factors can be tuned to get both a layer of high quality and a fast and cost effective process. We present here an annealing study with in-situ conductivity measurement to monitor the effect of temperature ramping, process time, process gas, etc. For ITO, we obtained a sheet resistance of 20 Ohm/sq for layers below 100 nm in thickness as a best result. Furthermore, the annealing process can be tuned to be within a couple of minutes. |
Databáze: | OpenAIRE |
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