Investigation of Cu/TaN and Co/TaN Barrier-Seed Oxidation by Acidic and Alkaline Copper Electroplating Chemistry for Damascene Applications
Autor: | Amine Lakhdari, Frédéric Raynal, Jackie Vigneron, Arnaud Etcheberry, Mikailou Thiam, Louis Caillard |
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Přispěvatelé: | aveni, massy, Institut Lavoisier de Versailles (ILV), Université de Versailles Saint-Quentin-en-Yvelines (UVSQ)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), aveni, F-91300 Massy |
Jazyk: | angličtina |
Rok vydání: | 2018 |
Předmět: |
Renewable Energy
Sustainability and the Environment Chemistry 020209 energy Copper interconnect 02 engineering and technology 021001 nanoscience & nanotechnology Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Chemical engineering 0202 electrical engineering electronic engineering information engineering Materials Chemistry Electrochemistry Copper plating [CHIM]Chemical Sciences 0210 nano-technology ComputingMilieux_MISCELLANEOUS |
Zdroj: | Journal of The Electrochemical Society Journal of The Electrochemical Society, Electrochemical Society, 2018, 165 (10), pp.D439-D443. ⟨10.1149/2.0761810jes⟩ |
ISSN: | 0013-4651 1945-7111 |
DOI: | 10.1149/2.0761810jes⟩ |
Popis: | International audience |
Databáze: | OpenAIRE |
Externí odkaz: |