Design and validation of a novel master-making process chain for organic and large area electronics on flexible substrates
| Autor: | V. Velkova, Jukka Hast, Steffen Scholz, Herbert Gold, Barbara Stadlober, Anja Haase, G. Lalev, Hassan Hirshy, Stefan Simeonov Dimov, Johanna Hiitola-Keinänen |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2010 |
| Předmět: |
Fabrication
Materials science Nanotechnology 02 engineering and technology OTFT 01 natural sciences Tool manufacture Nanoimprint lithography law.invention FIB Electroforming Machining law 0103 physical sciences Nano Hardware_INTEGRATEDCIRCUITS Electrical and Electronic Engineering 010302 applied physics Organic electronics Process chain 021001 nanoscience & nanotechnology Condensed Matter Physics R2R Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Nanolithography Template UV-NIL Photolithography 0210 nano-technology |
| Zdroj: | Velkova, V, Lalev, G, Hirshy, H, Scholz, S, Hiitola-Keinänen, J, Gold, H, Haase, A, Hast, J, Stadlober, B & Dimov, S 2010, ' Design and validation of a novel master-making process chain for organic and large area electronics on flexible substrates ', Microelectronic Engineering, vol. 87, no. 11, pp. 2139-2145 . https://doi.org/10.1016/j.mee.2010.01.015 Microelectronic Engineering |
| ISSN: | 1873-5568 0167-9317 |
| Popis: | This paper presents a novel process chain for fabrication of replication masters for serial manufacture. The proposed process chain is validated for serial fabrication of (large area) organic electronic devices on flexible substrates. The advantages and limitations of the component technologies in the proposed manufacturing route are discussed and their interdependencies in a process chain for producing both 2.5D and 3D nano- and micro-structures are analysed. The proposed master-making route relies on using different technologies for micro-structuring and sub-micron and nano patterning that are applied to the fabrication of Ni shims incorporating different length scale features. In particular, the capabilities of photolithography as a micro-structuring technology were combined with those of FIB machining to add sub-micron and nano-features on micro patterned fused silica templates. Then, by applying UV nanoimprint lithography such templates were validated and their nano and micro-structures were consistently replicated in one step. Finally, the feature transfer of such imprints onto Ni shims was also successfully accomplished with only minor deviations from the target dimensions. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect