Autor: |
Xinjun Hu, Yue Lu, Songbo Chen, Yu Ma, Yiqi Wu, Bai Yongxiao, Yuanzhi Chao, Dongchen Bai |
Rok vydání: |
2017 |
Předmět: |
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Zdroj: |
Chemical communications (Cambridge, England). 53(99) |
ISSN: |
1364-548X |
Popis: |
Hydroxyl radicals (˙OH) generated from a UV/O3 solution reaction is used to efficiently etch graphene oxide nanosheets under moderate conditions. Reduced holey graphene oxide is directly used as a supercapacitor electrode material and exhibits high specific capacitance (224 F g-1 at a current density of 1 A g-1) and high volumetric capacitance (up to 206 F cm-3). |
Databáze: |
OpenAIRE |
Externí odkaz: |
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