Sub-10 nm Silicon Nanopillar Fabrication Using Fast and Brushless Thermal Assembly of PS- b -PDMS Diblock Copolymer
| Autor: | Javier Arias-Zapata, Sandrine Arnaud, Olivier Marconot, Jérôme Garnier, Denis Buttard, Sophie Böhme, Cécile Girardot, Marc Zelsmann |
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| Přispěvatelé: | Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Silicon Nanoelectronics Photonics and Structures (SiNaps), PHotonique, ELectronique et Ingénierie QuantiqueS (PHELIQS), Université Grenoble Alpes [2016-2019] (UGA [2016-2019])-Institut de Recherche Interdisciplinaire de Grenoble (IRIG), Direction de Recherche Fondamentale (CEA) (DRF (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Direction de Recherche Fondamentale (CEA) (DRF (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])-Institut de Recherche Interdisciplinaire de Grenoble (IRIG), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), ANR-10-LABX-0055,MINOS Lab,Minatec Novel Devices Scaling Laboratory(2010) |
| Jazyk: | angličtina |
| Rok vydání: | 2016 |
| Předmět: |
[PHYS]Physics [physics]
Plasma etching Fabrication Materials science Silicon chemistry.chemical_element 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences chemistry Polymer chemistry Thermal Copolymer Grazing-incidence small-angle scattering General Materials Science Composite material 0210 nano-technology Wetting layer Nanopillar |
| Zdroj: | ACS Applied Materials & Interfaces ACS Applied Materials & Interfaces, 2016, 8 (15), pp.9954-9960. ⟨10.1021/acsami.6b01255⟩ ACS Applied Materials & Interfaces, Washington, D.C. : American Chemical Society, 2016, 8 (15), pp.9954-9960. ⟨10.1021/acsami.6b01255⟩ |
| ISSN: | 1944-8244 1944-8252 |
| DOI: | 10.1021/acsami.6b01255⟩ |
| Popis: | International audience; A new approach to obtaining spherical nanodomains using polystyrene-block-polydimethylsiloxane (PS-b-PDMS) is proposed. To reduce drastically the process time, we blended a copolymer with cylindrical morphology with a PS homopolymer. Adding PS homopolymer into a low-molar-mass cylindrical morphology PS-b-PDMS system drives it toward a spherical morphology. Besides, by controlling the as-spun state, spherical PDMS nanodomains could be kept and thermally arranged. This PS-homopolymer addition allows not only an efficient, purely thermal arrangement process of spheres but also the ability to work directly on nontreated silicon substrates. Indeed, as shown by STEM measurements, no PS brush surface treatment was necessary in our study to avoid a PDMS wetting layer at the interface with the Si substrate. Our approach was compared to a sphere-forming diblock copolymer, which needs a longer thermal annealing. Furthermore, GISAXS measurements provided complete information on PDMS sphere features. Excellent long-range order spherical microdomains were therefore produced on flat surfaces and inside graphoepitaxy trenches with a period of 21 nm, as were in-plane spheres with a diameter of 8 nm with a 15 min thermal annealing. Finally, direct plasma-etching transfer into the silicon substrate was demonstrated, and 20 nm high silicon nanopillars were obtained, which are very promising results for various nanopatterning applications. |
| Databáze: | OpenAIRE |
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