Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors
| Autor: | David Cameron, Aapo Varpula, Mikko Utriainen, Veli Matti Airaksinen, Juha Sinkkonen, Sami Franssila, Antti J. Niskanen, Sergey Novikov, Gomathi Natarajan |
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| Rok vydání: | 2010 |
| Předmět: |
Fabrication
Materials science Silicon dioxide ta221 chemistry.chemical_element Nanotechnology Dielectric Tungsten metal-oxide gas sensor chemistry.chemical_compound Atomic layer deposition Materials Chemistry Electrical and Electronic Engineering ta216 Instrumentation Tin dioxide Metal-oxide gas sensor Metals and Alloys microhotplate gas sensor Plasma Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry Chemical engineering atomic layer deposition tin dioxide Microhotplate gas sensor Acrylonitrile |
| Zdroj: | Niskanen, A J, Varpula, A, Utriainen, M, Natarajan, G, Cameron, D C, Novikov, S, Airaksinen, V-M, Sinkkonen, J & Franssila, S 2010, ' Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors ', Sensors and Actuators B: Chemical, vol. 148, no. 1, pp. 227-232 . https://doi.org/10.1016/j.snb.2010.05.018 |
| ISSN: | 0925-4005 |
| Popis: | We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed. |
| Databáze: | OpenAIRE |
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