λ/12 Super Resolution Achieved in Maskless Optical Projection Nanolithography for Efficient Cross-Scale Patterning
| Autor: | Feng Jin, Mei-Ling Zheng, Xuan-Ming Duan, Yu-Huan Liu, Xian-Zi Dong, Yuan-Yuan Zhao, Zhen-Sheng Zhao |
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| Rok vydání: | 2021 |
| Předmět: |
Fabrication
Materials science business.industry Mechanical Engineering Bioengineering 02 engineering and technology General Chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics Digital micromirror device law.invention Nanolithography law Microsystem Miniaturization Optoelectronics Printing General Materials Science Nanometre 0210 nano-technology Projection (set theory) business Lithography |
| Zdroj: | Nano letters. 21(9) |
| ISSN: | 1530-6992 |
| Popis: | The emerging demand for device miniaturization and integration prompts the patterning technique of micronano-cross-scale structures as an urgent desire. Lithography, as a sufficient patterning technique, has been playing an important role in achieving functional micronanoscale structures for decades. As a promising alternative, we have proposed and demonstrated the maskless optical projection nanolithography (MLOP-NL) technique for efficient cross-scale patterning. A minimum feature size of 32 nm, which is λ/12 super resolution breaking the optical diffraction limit, has been achieved by a single exposure. Furthermore, multiscale two-dimensional micronano-hybrid structures with the size over hundreds of micrometers and the precision at tens of nanometers have been fabricated by simply controlling the exposure conditions. The proposed MLOP-NL technique provides a powerful tool for achieving cross-scale patterning with both large-scale and precise configuration with high efficiency, which can be potentially used in the fabrication of multiscale integrated microsystems. |
| Databáze: | OpenAIRE |
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