Optimizing an electrochemical deposition process by use of design of computer experiments
Autor: | J.-P. Caire, B. Nguyen, F. Gerard, D. Rabiot, Eric Chainet |
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Přispěvatelé: | Laboratoire d'Electrochimie et de Physico-chimie des Matériaux et des Interfaces (LEPMI ), Institut de Chimie du CNRS (INC)-Institut National Polytechnique de Grenoble (INPG)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Joseph Fourier - Grenoble 1 (UJF)-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS), Alcatel Alsthom Recherche, ALCATEL |
Rok vydání: | 1998 |
Předmět: |
Computer science
02 engineering and technology 01 natural sciences response surface methodology 010104 statistics & probability [CHIM.GENI]Chemical Sciences/Chemical engineering Wafer Response surface methodology 0101 mathematics Process engineering Computer simulation business.industry Design of experiments General Engineering Process (computing) General Chemistry desirability functions 021001 nanoscience & nanotechnology Computer experiment computer experiments design of experiments Electrodeposition process A priori and a posteriori 0210 nano-technology business Deposition process |
Zdroj: | Analusis Analusis, EDP Sciences, 1998, 26 (8), pp.281-283. ⟨10.1051/analusis:1998172⟩ |
ISSN: | 1286-482X 0365-4877 |
DOI: | 10.1051/analusis:1998172 |
Popis: | International audience; A response surface methodology only based in this case on computer experiments was used in conjunction with the desirability concept to optimize a priori an electrodeposition process designed for production of gold-tin alloy bumps on a 4 inches wafer. The efficiency of the method was used to achieve at a cheap cost with a small number of computer experiments the technical specifications required in term of metal deposit thickness uniformity. |
Databáze: | OpenAIRE |
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