Combined characterization of conductive materials by infrared spectroscopic ellipsometry and grazing X-ray reflectance
| Autor: | Louis Hennet, Pierre Boher, Michel Luttmann, Jean Louis Stehle |
|---|---|
| Přispěvatelé: | SOPRA, Laboratoire de Métallurgie Physique et Science des Matériaux (URA CNRS 155) (LMPSM), Université Henri Poincaré - Nancy 1 (UHP)-Centre National de la Recherche Scientifique (CNRS) |
| Jazyk: | angličtina |
| Rok vydání: | 1998 |
| Předmět: |
010302 applied physics
Materials science Metals and Alloys Analytical chemistry Infrared spectroscopy chemistry.chemical_element 02 engineering and technology Surfaces and Interfaces 021001 nanoscience & nanotechnology 01 natural sciences Drude model Surfaces Coatings and Films Electronic Optical and Magnetic Materials Characterization (materials science) Absorbance chemistry Electrical resistivity and conductivity 0103 physical sciences Materials Chemistry Surface roughness [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] Thin film 0210 nano-technology ComputingMilieux_MISCELLANEOUS Titanium |
| Zdroj: | Thin Solid Films Thin Solid Films, Elsevier, 1998, 319 (1-2), pp.67-72. ⟨10.1016/s0040-6090(97)01087-0⟩ |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/s0040-6090(97)01087-0⟩ |
| Popis: | Non-destructive, non-contact characterization of conductive materials is an interesting challenge, especially in the field of microelectronics. One way to solve the problem is to use the optical properties of the materials that follow theoretically a Drude law in the infrared region. In this study, spectroscopic ellipsometry in the mid-infrared (up to 17 μ m) is used to extract the optical indices. To evaluate the electrical properties, the thickness of the layer is also needed. Due to the generally high absorbance of these conductive layers, it cannot be extracted directly from the ellipsometric measurements. In this study, we use a complementary technique called grazing X-ray reflectance (GXR). Eleven titanium/SiO 2 /Si samples with variable titanium thickness have been successively examined. The different thicknesses have been determined precisely by grazing X-ray reflectance at the Co K- α line with the surface roughness of the samples. Conventional X-ray diffraction was also used to determine the crystallinity of the titanium layers. Then IR spectroscopic ellipsometry was used to extract the optical indices of the different titanium layers and their resistivity using the GXR thickness and the Drude model. Values determined by this method compare well with four-point probe resistive measurements made on the same samples. The density of the titanium layers and the thickness of the bottom SiO 2 layer can be also evaluated in some cases. |
| Databáze: | OpenAIRE |
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