Chemical Vapour Deposition for Optical Fibre Technology
| Autor: | L. Cognolato |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 1995 |
| Předmět: |
Optical fiber
Chemistry General Physics and Astronomy Nanotechnology 02 engineering and technology Chemical vapor deposition 021001 nanoscience & nanotechnology law.invention 020210 optoelectronics & photonics law [PHYS.HIST]Physics [physics]/Physics archives Moment (physics) 0202 electrical engineering electronic engineering information engineering 0210 nano-technology |
| Zdroj: | Journal de Physique IV Proceedings Journal de Physique IV Proceedings, EDP Sciences, 1995, 05 (C5), pp.C5-975-C5-987. ⟨10.1051/jphyscol:19955115⟩ |
| ISSN: | 1155-4339 1764-7177 |
| DOI: | 10.1051/jphyscol:19955115⟩ |
| Popis: | At the beginning of the seventies, a break-through took place in the telecommunication research. The introduction of Chemical Vapour Deposition technology in the manufacture of optical fibres allowed both technical quality and economical convenience to realise optical networks, thus beginning the telecommunication revolution. Since that moment, a great development of the CVD techniques has been performed, introducing several methods to produce fibres with geometry and optical properties optimised for different applications. An overview of the different methods is given, and the problems which have been to be solved in these years are described. |
| Databáze: | OpenAIRE |
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