Diffraction gratings based on a multilayer silicon nitride waveguide with high upward efficiency and large effective length
| Autor: | Wen-Ling Li, Jing-Wei Liu, Guo-An Cheng, Qing-Zhong Huang, Rui-Ting Zheng, Xiao-Ling Wu |
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| Rok vydání: | 2022 |
| Předmět: | |
| Zdroj: | Applied optics. 61(10) |
| ISSN: | 1539-4522 |
| Popis: | Diffraction gratings with high upward diffraction efficiency and large effective length are required for chip-scale light detection and ranging. In this paper, we propose a diffraction grating based on a multilayer silicon nitride waveguide, which theoretically achieves an upward diffraction efficiency of 92$\%$, a near-field effective length of 376 $\mu m$ and a far-field divergence angle of 0.105$^{\circ}$ at a wavelength of 850 nm. The diffraction grating has a high tolerance to process variations based on Monte Carlo Analysis. When the conditions are $\pm$5$\%$ layer thickness variation, $\pm$50 nm lithographic variation and $\pm$20 nm wavelength drift, more than 71$\%$ of the grating samples have a diffraction efficiency higher than 80$\%$, and 100$\%$ of the samples have an effective length larger than 200 $\mu m$ (corresponding to a far-field divergence Comment: 8 pages, 5 figures, 1 table, research article |
| Databáze: | OpenAIRE |
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