Gold ion implantation into alumina using an 'inverted ion source' configuration

Autor:	Efim Oks, Ian G. Brown, Mauro Sergio Dorsa Cattani, W. W. R. Araujo, Fernanda de Sá Teixeira, Maria Cecília Barbosa da Silveira Salvadori, L. G. Sgubin, R. E. Spirin
Rok vydání:	2014
Předmět:	Materials science Ion beam deposition Ion implantation Ion beam mixing Percolation theory Ion beam Electrical resistivity and conductivity Physics::Medical Physics NANOPARTÍCULAS Plasma Atomic physics Instrumentation Ion source
Zdroj:	Repositório Institucional da USP (Biblioteca Digital da Produção Intelectual) Universidade de São Paulo (USP) instacron:USP
Popis:	We describe an approach to ion implantation in which the plasma and its electronics are held at ground potential and the ion beam is injected into a space held at high negative potential, allowing considerable savings both economically and technologically. We used an "inverted ion implanter" of this kind to carry out implantation of gold into alumina, with Au ion energy 40 keV and dose (3-9) × 10(16) cm(-2). Resistivity was measured in situ as a function of dose and compared with predictions of a model based on percolation theory, in which electron transport in the composite is explained by conduction through a random resistor network formed by Au nanoparticles. Excellent agreement is found between the experimental results and the theory.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4b16423fae90d6306a3e88146c66e320 Zobrazit plný text záznamu