Theoretical analysis of induction heating in high-temperature epitaxial growth system
| Autor: | Jiang Lijuan, Jiankai Xu, Xiangang Xu, Meilan Hao, Quan Wang, Hongling Xiao, Fengqi Liu, Chun Feng, Mei Shuzhe, Xiaoliang Wang, Zhanguo Wang, Haibo Yin |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Materials science Induction heating General Physics and Astronomy 02 engineering and technology 021001 nanoscience & nanotechnology Thermal conduction 01 natural sciences lcsh:QC1-999 Magnetic field law.invention law Electromagnetic coil 0103 physical sciences Skin effect Wafer Composite material 0210 nano-technology Air gap (plumbing) lcsh:Physics Susceptor |
| Zdroj: | AIP Advances, Vol 8, Iss 8, Pp 085114-085114-9 (2018) |
| ISSN: | 2158-3226 |
| Popis: | The temperature uniformity and heating efficiency in a high-temperature epitaxial growth system were investigated by modeling and simulating. The finite element method (FEM) was used to calculate the distribution of magnetic field and temperature field in the reactor of growth system. The simulation results showed that due to the skin effect and heat conduction in the conventional susceptor, the temperature distribution of the wafer on the susceptor is not uniform. However, the temperature uniformity of the wafer can be greatly improved by adding an air gap below the wafer. The existence of air gap effectively reduced the temperature on the center of the wafer, and the effect of its radius on temperature uniformity was studied. By calculating different frequencies and coil currents, the temperature and heating rate in the reactor with modified susceptor were investigated. The results indicated that higher temperature and faster heating rate can be obtained by increasing heating frequency and coil current. However, both lower and higher frequency will bring worse temperature uniformity. |
| Databáze: | OpenAIRE |
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