Effects of thick aberrators in one-way imaging schemes
| Autor: | David R. Martinez, Lee P. Schelonka, Thomas G. Alley, Mark A. Kramer |
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| Rok vydání: | 1990 |
| Předmět: |
Single pass
Materials science business.industry Image quality Materials Science (miscellaneous) Image processing Iterative reconstruction Image degradation Industrial and Manufacturing Engineering law.invention Four-wave mixing Optics law Business and International Management Phase conjugation business Beam splitter |
| Zdroj: | Applied Optics. 29:2576 |
| ISSN: | 1539-4522 0003-6935 |
| DOI: | 10.1364/ao.29.002576 |
| Popis: | The ability of one-way imaging schemes to correct for the effects of thick aberrators is examined. These schemes correct an image for the influence of an intervening aberrator in a single pass. Single-pass image correction is observed for thick aberrators that change in times that are short compared with the nonlinear response time of the four-wave mixing material. Image degradation is observed for static aberrators. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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